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c 延期信息
| 延期理由: |
由于该项目报价情况不满足要求,本项目延期至2025-10-21 18:00 |
| 项目名称 |
SOI晶圆 |
项目编号 |
**** |
| 公告开始日期 |
2025-10-16 16:18:54 |
公告截止日期 |
2025-10-21 18:00:00 |
| 采购单位 |
**** |
付款方式 |
货到付款,甲方在到货验收后15日内向乙方一次性支付本项目的总额 |
| 联系人 |
成交后在我参与的项目中查看 |
联系电话 |
成交后在我参与的项目中查看 |
| 签约时间要求 |
成交后3个工作日内 |
到货时间要求 |
签约后3个工作日内 |
| 预算总价 |
¥ 406,800.00 |
| 收货地址 |
****中心水博园_校区A11楼FAB房间 |
| 供应商资质要求 |
符合《政府采购法》第二十二条规定的供应商基本条件 |
| 公告说明 |
由于该项目报价情况不满足要求,本项目延期至2025-10-21 18:00 |
采购清单 1
| 采购商品 |
采购数量 |
计量单位 |
所属分类 |
| SOI晶圆 |
25 |
张 |
合成材料 |
| 预算单价 |
¥ 8,136.00 |
| 技术参数及配置要求 |
技术规格Product Technical Specification: 1.1 规格见附页(COA规格)Specifications(COA content): No. Items Unit Specifications 1. Top Silicon layer 1.1 Metrology Edge Exclusion(EE) mm 3 *1.2 Top Silicon layer Thickness nm 220+/-3.5 1.3 Top Silicon layer Conductivity Type P type 1.4 Top Silicon layer Dopant Boron *1.5 Top Silicon layer Resistivity ohm-cm 10-15 *1.6 Top Silicon layer Crystal Orientation degree (100) +/-0.5° 1.7 Top Silicon layer Crystal Growth Method MCZ cop free *1.8 localized light scatters defects (LLS) >=0.09 um ea/wafer <=200 >=0.25 um ea/wafer <=50 1.9 Surface defects (Edge chips, scratch, slip, stain) ea/wafer <=0 1.10 Voids>=0.5mm ea/wafer <=0 *1.11 Surface metal: Al, Ca, K, atom/cm2 <=3E10 *1.12 Surface metal: Fe, Cr, Cu, Ni, Zn, Na atom/cm2 <=1E10 1.13 Surface roughness <=4 2. Buried oxide layer *2.1 BOX Thickness nm 2000+/-20 3. Handle wafer *3.1 Handle wafer Thickness um 775+/-15 3.2 Handle wafer Conductivity Type P type 3.3 Handle wafer Dopant Boron *3.4 Handle wafer Resistivity ohm-cm >=8 *3.5 Handle wafer Crystal Orientation degree (100) +/-0.5° *3.6 Handle wafer Notch Orientation degree <110> +/-0.5° 3.7 Handle wafer Crystal Growth Method MCZ 3.8 wafer ID marking Backside T7+OCR 3.9 Backside surface Oxidized *3.10 Diameter mm 300.0+/-0.2 *3.11 Total Thickness Variation (GBIR) um <=10 *3.12 Warp um <=60 4. Shipping Box 4.1 Shipping Box SEP, MW300GT; 25pcs box Back up: Miraial KT3004A-4, ePAK eFOSB 300 |
| 售后服务 |
电话支持:7x8小时;质保期:1年;服务时限:报修后4小时;商品承诺:原厂全新未拆封正品;发放专项项目预算不控制,没有材料费选项,可以报销耗材支出。; |
采购清单 2
| 采购商品 |
采购数量 |
计量单位 |
所属分类 |
| SOI晶圆 |
50 |
张 |
合成材料 |
| 预算单价 |
¥ 4,068.00 |
| 技术参数及配置要求 |
3BNQS2T000 Top 220nm,Box 2μm\降级 技术规格Product Technical Specification: 1.1 规格见附页(COA规格)Specifications(COA content): No. Items Unit Specifications 1. Top Silicon layer 1.1 Metrology Edge Exclusion(EE) mm 3 *1.2 Top Silicon layer Thickness nm 220+/-3.5 1.3 Top Silicon layer Conductivity Type P type 1.4 Top Silicon layer Dopant Boron *1.5 Top Silicon layer Resistivity ohm-cm 10-15 *1.6 Top Silicon layer Crystal Orientation degree (100) +/-0.5° 1.7 Top Silicon layer Crystal Growth Method MCZ cop free *1.8 localized light scatters defects (LLS) >=0.09 um ea/wafer <=200 >=0.25 um ea/wafer <=50 1.9 Surface defects (Edge chips, scratch, slip, stain) ea/wafer <=0 1.10 Voids>=0.5mm ea/wafer <=0 *1.11 Surface metal: Al, Ca, K, atom/cm2 <=3E10 *1.12 Surface metal: Fe, Cr, Cu, Ni, Zn, Na atom/cm2 <=1E10 1.13 Surface roughness <=4 2. Buried oxide layer *2.1 BOX Thickness nm 2000+/-20 3. Handle wafer *3.1 Handle wafer Thickness um 775+/-15 3.2 Handle wafer Conductivity Type P type 3.3 Handle wafer Dopant Boron *3.4 Handle wafer Resistivity ohm-cm >=8 *3.5 Handle wafer Crystal Orientation degree (100) +/-0.5° *3.6 Handle wafer Notch Orientation degree <110> +/-0.5° 3.7 Handle wafer Crystal Growth Method MCZ 3.8 wafer ID marking Backside T7+OCR 3.9 Backside surface Oxidized *3.10 Diameter mm 300.0+/-0.2 *3.11 Total Thickness Variation (GBIR) um <=10 *3.12 Warp um <=60 4. Shipping Box 4.1 Shipping Box SEP, MW300GT; 25pcs box Back up: Miraial KT3004A-4, ePAK eFOSB 300 |
| 售后服务 |
电话支持:7x8小时;质保期:1年;服务时限:报修后4小时;商品承诺:原厂全新未拆封正品;发放专项项目预算不控制,没有材料费选项,可以报销耗材支出。; |
****
2025-10-16 16:18:54